China National Intellectual Property Administration database and official announcements

China Announces Breakthroughs in Homegrown Chip Lithography Technology, Producing 8nm or Below

Sep 16, 2024, 06:46 AM

China has announced significant technological breakthroughs in its semiconductor industry, specifically in the development of homegrown chip lithography machines. The Ministry of Technology claims advancements in deep-ultraviolet (DUV) lithography, with a new machine capable of producing chips of 8nm or below, as noted in a government catalogue. The SMEE's extreme ultraviolet (EUV) radiation generators and lithography equipment patent, filed in March 2023, is currently under review by the China National Intellectual Property Administration. This development is seen as a crucial step in China's efforts to achieve semiconductor self-sufficiency amid ongoing US sanctions. State-linked organizations have been advised to use the new lithography machine with a resolution of 65nm or better, indicating a notable improvement in China's DUV technology.